Ion chemistry in tetramethylsilane (CH3)4Si
β Scribed by S. McGinnis; K. Riehl; P.D. Haaland
- Book ID
- 103034582
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 298 KB
- Volume
- 232
- Category
- Article
- ISSN
- 0009-2614
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β¦ Synopsis
The cross sections for simple and dissociative ionization of tetramethylsilane ((CHa)4Si or TMS) by electron impact have been measured using Fourier-transform mass spectrometry. The total ionization cross section is 8.5 Γ 10-~6 cm 2 between 30 and 70 eV. The molecular ion is Jahn-Teller unstable, with dissociative ionization to form (CH3)aSi + dominating the mass spectrum. CHaSiH~ and CH3Si + react rapidly with TMS to produce (CHa)3Si +. (CH3)3Si + does not react with TMS but is slowly hydrated by background water vapor.
π SIMILAR VOLUMES
The cross sections for simple and dlssoclatlve lomzatlon of tetraethoxyorthoslhcate ( ( CIHSO ),d or TEOS) by electron impact have been measured using Fourier-transform mass spectrometry The total lomzatlon cross section 1s (2 5 + 0 5) x 10-Ls cm2 between 20 and 50 eV Stolchlometnes of the cations w