✦ LIBER ✦

The role of substrate temperature and bias in the plasma deposition from tetramethylsilane

✍ Scribed by Favia, P; Lamendola, R; d'Agostino, R

Book ID: 120466160
Publisher: Institute of Physics
Year: 1992
Tongue: English
Weight: 518 KB
Volume: 1
Category: Article
ISSN: 0963-0252
DOI: 10.1088/0963-0252/1/1/007

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Effect of substrate bias and deposition

Effect of substrate bias and deposition temperature on the properties of thick sputtered chromium deposits

✍ Patten, J. W. 📂 Article 📅 1972 🏛 American Institute of Physics 🌐 English ⚖ 519 KB

Deposition of tetramethylsilane on the g

Deposition of tetramethylsilane on the glass by plasma-enhanced chemical vapor deposition and atmospheric pressure plasma treatment

✍ Chen, Ko-Shao; Liao, Shu-Chuan; Tsao, Shao-Hsuan; Inagaki, Norihiro; Wu, Hsin-Mi 📂 Article 📅 2013 🏛 Elsevier Science 🌐 English ⚖ 903 KB

Effects of substrate bias and temperatur

Effects of substrate bias and temperature during titanium sputter-deposition on the phase formation in TiSi2

✍ N Lundqvist; J Åberg; S Nygren; C.-Å Björmander; S.-L Zhang 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 688 KB

The formation of titanium disilicide (TiSi ) from Ti deposited using ionized metal plasma under different 2 deposition conditions has been investigated. It is shown that deposition at elevated substrate temperature (4508C) enhances the formation of the low-resistivity C54 TiSi , especially in patter

Estimation of the coating/substrate inte

Estimation of the coating/substrate interface temperature during deposition by impulse plasma excitation

✍ Krzystof Zdunek 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 736 KB

The role of substrate surface terminatio

The role of substrate surface termination in the deposition of

✍ S. Neretina; R. A. Hughes; J. F. Britten; N. V. Sochinskii; J. S. Preston; P. Ma 📂 Article 📅 2009 🏛 Springer 🌐 English ⚖ 408 KB

Effect of the substrate temperature and

Effect of the substrate temperature and deposition rate on the initial growth of thin lithium niobate-tantalate films deposited from a thermal plasma

✍ S. A. Kulinich; T. Yamaki; H. Miyazoe; H. Yamamoto; K. Terashima 📂 Article 📅 2006 🏛 SP MAIK Nauka/Interperiodica 🌐 English ⚖ 380 KB