𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effect of substrate bias and deposition temperature on the properties of thick sputtered chromium deposits

✍ Scribed by Patten, J. W.


Book ID
126897728
Publisher
American Institute of Physics
Year
1972
Tongue
English
Weight
519 KB
Volume
43
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Effects of substrate bias and temperatur
✍ N Lundqvist; J Γ…berg; S Nygren; C.-Γ… BjΓΆrmander; S.-L Zhang πŸ“‚ Article πŸ“… 2002 πŸ› Elsevier Science 🌐 English βš– 688 KB

The formation of titanium disilicide (TiSi ) from Ti deposited using ionized metal plasma under different 2 deposition conditions has been investigated. It is shown that deposition at elevated substrate temperature (4508C) enhances the formation of the low-resistivity C54 TiSi , especially in patter