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The role of oxygen additions in the plasma etching of silicon in tetrafluoromethane and elegas (SF6)

✍ Scribed by A. A. Goncharenko; D. I. Slovetskii; E. F. Shelykhmanov

Publisher
Springer US
Year
1983
Tongue
English
Weight
642 KB
Volume
38
Category
Article
ISSN
0021-9037

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