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The neutralization of sodium ions in plasma-deposited SiO2 layers

โœ Scribed by S.S. Georgiev


Book ID
103423528
Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
450 KB
Volume
121
Category
Article
ISSN
0040-6090

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The properties of Ru films deposited by
โœ Park, Taeyong ;Choi, Dongjin ;Choi, Hagyoung ;Jeon, Hyeongtag ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 405 KB

## Abstract By using remote plasma atomic layer deposition (ALD), ruthenium thin films were deposited on SiO~2~ using bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)~2~] as a Ru precursor and an ammonia plasma as a reactant. Different plasma treatments were applied, and the best results were obtained