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Influence of APS bias voltage on properties of HfO2 and SiO2 single layer deposited by plasma ion-assisted deposition

✍ Scribed by Meiping Zhu, 朱美萍; Kui Yi, 易葵; Zhengxiu Fan, 范正修; Jianda Shao, 邵建达

Book ID: 115369014
Publisher: Optics InfoBase
Year: 2011
Tongue: English
Weight: 177 KB
Volume: 9
Category: Article
ISSN: 1671-7694
DOI: 10.3788/COL201109.023101

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