The mechanism of shock
โ Scribed by David K. Brooks
- Publisher
- John Wiley and Sons
- Year
- 1967
- Tongue
- English
- Weight
- 599 KB
- Volume
- 54
- Category
- Article
- ISSN
- 0007-1323
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
The shock-induced thermal decompositions of vinylsilane and vinylsilane-d, (0.2% on argon) have been studied in the temperature range of 1085-1275 K, and at total pressures of about 3100 tom. In systems without silylene traps, some induced decomposition occurs which is attributed to the silylene cha
The decomposition kinetics of ethylsilane under shock tube conditions (P, ca. 3100 torr, T = 1080-1245 K), both in the absence and presence of silylene trapping agents (butadiene and acetylene) are reported. Arrhenius parameters under maximum butadiene inhibition are: log K(C,H,SiH,) = 15.14-64,769