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The lateral diffusion of boron in polycrystalline silicon and its influence on the fabrication of sub-micron MOSTs

✍ Scribed by D.J. Coe

Publisher: Elsevier Science
Year: 1977
Tongue: English
Weight: 641 KB
Volume: 20
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(77)90208-8

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