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The lateral diffusion of boron in polycrystalline silicon and its influence on the fabrication of sub-micron MOSTs : D. J. Coe. Solid-St. Electron.20, 985 (1977)


Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
135 KB
Volume
17
Category
Article
ISSN
0026-2714

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