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The investigation on the microstructure of magnetron sputtering ion plated Al/Cu film: The effect of substrate negative bias voltage

✍ Scribed by B.Q. Chen; F.J. Wang; Y.K. Wang; J.X. Wang; H.M. Han; C.N. Wang; T.Y. Niu; H.W. Gao

No coin nor oath required. For personal study only.

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