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The interdiffusion and solid-state reaction of low-energy copper ions implanted in silicon

✍ Scribed by Xing-Xin Gao; Tian-Jing Li; Gong-Ping Li; Bo Cao

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 286 KB
Volume: 266
Category: Article
ISSN: 0168-583X
DOI: 10.1016/j.nimb.2008.03.082

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