The interaction of CF3 radicals and CF3 radical precursors with SiO2 surfaces
β Scribed by F.R. McFeely; J.A. Yarmoff; A. Taleb-Ibrahimi; D.B. Beach
- Book ID
- 118362093
- Publisher
- Elsevier Science
- Year
- 1988
- Tongue
- English
- Weight
- 571 KB
- Volume
- 206
- Category
- Article
- ISSN
- 0039-6028
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π SIMILAR VOLUMES
## Abstract The relative rate technique has been used to determine the rate constants of the reactions of OH radicals with CF~3~CClο£ΎCCl~2~ (__k__~1~), CF~3~CClο£ΎCClCF~3~ (__k__~2~) and CF~3~CFο£ΎCFCF~3~ (__k__~3~). Experiments were carried out at (298Β±2) K and atmospheric pressure using ultrapure nitr
Rate constants have been measured over the temperature range 245-419 K for the gas-phase reactions of the hydmxyl radical with the hydrofluorocarbons CHF,CF,CF,CHF, and CF&HFCHFCF2CF,. The Arrhenius expressions k (CHF,CF,CFzCHF,) =(7.80i3.40)X10-'3exp[-(1.51~0.26)~103/T] and k(CF,CHFCHFCF~CF,)=(4.21
The rate constants for the reactions of OH radicals with CH 3 OCF 2 CF 3 , CH 3 OCF 2 CF 2 CF 3 , and CH 3 OCF(CF 3 ) 2 have been measured over the temperature range 250-430 K. Kinetic measurements have been carried out using the flash photolysis, laser photolysis, and discharge flow methods combine