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The influence of nitrogen ion energy on the quality of GaN films grown with molecular beam epitaxy

✍ Scribed by T. C. Fu; N. Newman; E. Jones; J. S. Chan; X. Liu; M. D. Rubin; N. W. Cheung; E. R. Weber


Book ID
112817034
Publisher
Springer US
Year
1995
Tongue
English
Weight
689 KB
Volume
24
Category
Article
ISSN
0361-5235

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The photoreflectance (PR) lineshape of GaN films grown by molecular beam epitaxy was investigated in the temperature range of 10 to 400 K. At low temperatures, the lineshape is dominated by excitonic transitions and can be reasonably well fitted using the first derivative of a Gaussianbroadened osci