The influence of hydrogen gas on the characteristics of amorphous silicon deposited by RF sputtering: J. T. Lue, O. Meyer and J. Lombaard Solid-St. Electron. 25 (10), 1011 (1982)

• Book ID: 104157165
• Publisher: Elsevier Science
• Year: 1984
• Tongue: English
• Weight: 94 KB
• Volume: 15
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(84)80102-0