𝔖 Bobbio Scriptorium

✦ LIBER ✦

The influence of carbon dioxide on the growth mechanism of silicon autoepitaxial films during vacuum deposition: A V Popov et al, Sb Nauchn Tr Probl Mikroelektron, 4, Mosk Inst Elektron Tekh, 1969, 109–112 (in Russian)

Publisher: Elsevier Science
Year: 1971
Tongue: English
Weight: 307 KB
Volume: 21
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(71)90169-2

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