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Deposition of autoepitaxial silicon films from molecular beams in high vacuum with controlled gas composition: V A Ushakov et al, Sb Nauchn Tr Probl Mikroelektron, 4, Mosk Inst Elektron Tekh, 1969, 192–200 (in Russian)


Publisher
Elsevier Science
Year
1971
Tongue
English
Weight
151 KB
Volume
21
Category
Article
ISSN
0042-207X

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