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The influence of AlxGa1−xN intermediate buffer layer on the characteristics of GaN/Si(1 1 1) epitaxy

✍ Scribed by Seong-Hwan Jang; Seong-Suk Lee; Oh-Yeon Lee; Cheul-Ro Lee


Book ID
108341952
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
534 KB
Volume
255
Category
Article
ISSN
0022-0248

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The authors report the growth of crack-free GaN on Si(1 1 1) substrate with step-graded AlGaN intermediate layers all grown at 1120 • C. By preparing all these layers at high-temperature, we can simplify the growth proceduce and minimize the growth time. Using X-ray diffraction and transmission elec