GaN grown on Si(1 1 1) with st
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C.C. Huang; S.J. Chang; R.W. Chuang; J.C. Lin; Y.C. Cheng; W.J. Lin
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Article
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2010
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Elsevier Science
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English
⚖ 801 KB
The authors report the growth of crack-free GaN on Si(1 1 1) substrate with step-graded AlGaN intermediate layers all grown at 1120 • C. By preparing all these layers at high-temperature, we can simplify the growth proceduce and minimize the growth time. Using X-ray diffraction and transmission elec