A single high temperature AlN (HT-AlN) buffer has been used to relieve the stress in the growth of GaN epilayers on Si (1 1 1) substrates, but the growth of crack-free GaN on Si is still difficult due to the large mismatch of the lattice and coefficient of thermal-expansion (CTE) between GaN and Si.
Influence of AlN buffer layer thickness on the properties of GaN epilayer on Si(1 1 1) by MOCVD
โ Scribed by Weijun Luo; Xiaoliang Wang; Lunchun Guo; Hongling Xiao; Cuimei Wang; Junxue Ran; Jianping Li; Jinmin Li
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 253 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0026-2692
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