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Influence of AlN buffer layer thickness on the properties of GaN epilayer on Si(1 1 1) by MOCVD

โœ Scribed by Weijun Luo; Xiaoliang Wang; Lunchun Guo; Hongling Xiao; Cuimei Wang; Junxue Ran; Jianping Li; Jinmin Li


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
253 KB
Volume
39
Category
Article
ISSN
0026-2692

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๐Ÿ“œ SIMILAR VOLUMES


Growth of GaN film on Si (1 1 
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A single high temperature AlN (HT-AlN) buffer has been used to relieve the stress in the growth of GaN epilayers on Si (1 1 1) substrates, but the growth of crack-free GaN on Si is still difficult due to the large mismatch of the lattice and coefficient of thermal-expansion (CTE) between GaN and Si.

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