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The impact of thin film interference effects on sub-micron lithography processing.

โœ Scribed by G.D. Maxwell; A.J.W. Tol; F.A. Vollenbroek; Y.F. Rody

Book ID
107920429
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
440 KB
Volume
11
Category
Article
ISSN
0167-9317

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The effect of develop time (DT) on process control of the sub-half-micron optical lithography step of a production CMOS process is examined. It is shown that develop times greater than those generally used increase the depth-of-focus (DOF), exposure latitude (EL), linearity, exposure margin and resi