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The growth rate of GaN epilayers in HVPE process

✍ Scribed by A. A. Arendarenko; E. N. Vigdorovich; Yu. N. Sveshnikov


Book ID
104556388
Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
144 KB
Volume
0
Category
Article
ISSN
1862-6351

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## Abstract HVPE growth in horizontal flow reactor has been analysed using finite element calculations and molecular estimates of the reaction rates. Finite element code FIDAP (commercially available from Fluent Inc.) has been used to calculate the flow pattern in the reactor. In the first approxim