The effects of RF plasma excitation frequency and doping gas on the deposition of polymorphous silicon thin films

✍ Scribed by V. Suendo; A.V. Kharchenko; P. Roca i Cabarrocas

• Book ID: 113936527
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 299 KB
• Volume: 451-452
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2003.11.019