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The effects of neutron irradiation and low temperature annealing on the electrical properties of highly doped 4H silicon carbide

✍ Scribed by Ekrem Almaz; Stephen Stone; Thomas E. Blue; Joseph P. Heremans


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
660 KB
Volume
622
Category
Article
ISSN
0168-9002

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## Dielectric constant Leakage current density La-doped BaTiO 3 thin films with 200 nm thickness were fabricated by r.f. magnetron sputtering system onto Pt/Ti/SiO 2 /Si substrates. The effects of post-annealing and the amount of dopant on microstructure and electrical properties were studied. The