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The effect of the reaction temperature on the thermal stability of polycrystalline CoSi2 layers on Si(001)

✍ Scribed by A. Alberti; L. Kappius; S. Mantl

Book ID
108411138
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
813 KB
Volume
55
Category
Article
ISSN
0167-9317

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The effect of lateral dimensional scaling on the thermal stability of polycrystalline cobalt disilicide wires reacted on Si (001) has been studied down to 0.6 mm linewidth. An unpatterned silicide has been used as a reference sample. The annealing processes were performed in N environment, between 9