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The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure

✍ Scribed by T. Nabatame; K Segawa; M. Kadoshima; H. Takaba; K. Iwamoto; S. Kimura; Y. Nunoshige; H. Satake; T. Ohishi; Akira Toriumi


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
276 KB
Volume
9
Category
Article
ISSN
1369-8001

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Organic thin-film transistors (OTFTs) using high dielectric constant material tantalum pentoxide (Ta 2 O 5 ) and benzocyclobutenone (BCBO) derivatives as double-layer insulator were fabricated. Three metals with different work function, including Al (4.3 eV), Cr (4.5 eV) and Au (5.1 eV), were employ