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The effect of hydrogen in the mechanism of aluminum-induced crystallization of sputtered amorphous silicon using scanning Auger microanalysis

✍ Scribed by Maruf Hosssain; Harry M. Meyer III; Husam H. Abu-Safe; Hameed A. Naseem; William D. Brown


Book ID
108289323
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
1000 KB
Volume
510
Category
Article
ISSN
0040-6090

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A number of alkylsilanes and alkylcarbosilanes of widely different molecular structure are characterized in terms of their ability to form amorphous hydrogenated silicon-carbon (a-Si:C:H) films in atomic hydrogen-induced chemical vapor deposition (AHCVD). The compounds containing only Si-C and C-H b