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The effect of contact resistance on current crowding and electromigration in ULSI multi-level interconnects

✍ Scribed by J.S Huang; Everett C.C Yeh; Z.B Zhang; K.N Tu

Book ID: 114193018
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 237 KB
Volume: 77
Category: Article
ISSN: 0254-0584
DOI: 10.1016/s0254-0584(02)00018-4

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