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The effect of annealing and hydrogenation on the dislocation conduction in silicon

✍ Scribed by Kveder, V. V. ;Osipyan, Yu. A. ;Sagdeev, I. R. ;Shalynin, A. I. ;Zolotukhin, M. N.


Publisher
John Wiley and Sons
Year
1985
Tongue
English
Weight
572 KB
Volume
87
Category
Article
ISSN
0031-8965

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Thin foils of quenched aluminium have been annealed at hydrostatic pressures up to 60 kb and temperatures up to 289Β°C. Observation by transmission electron microscopy before and after treatment has enabled a determination of temperature ranges within which dislocation loops anneal out at different p