The early oxynitridation stages of hydrogen-terminated (100) silicon after exposure to N2 : N2O. IV: Oxide structure and growth kinetics in the monolayer regime

✍ Scribed by G.F. Cerofolini; C. Galati; S. Reina; L. Renna; P. Ward

• Publisher: Springer
• Year: 2005
• Tongue: English
• Weight: 600 KB
• Volume: 81
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s00339-004-2550-0