๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

The dopant density and temperature dependence of electron mobility and resistivity in n-type silicon

โœ Scribed by Sheng S. Li; W.Robert Thurder


Publisher
Elsevier Science
Year
1977
Tongue
English
Weight
639 KB
Volume
20
Category
Article
ISSN
0038-1101

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Concerning the density and temperature d
โœ John M. Warman; Ulrich Sowada; D.A. Armstrong ๐Ÿ“‚ Article ๐Ÿ“… 1981 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 406 KB

The marked decrease in the mobhty of electrons in high-pressure CO? is found to be due to t\w effects. One results in SI "lmmedlate" (subnanosecond) reduction and is ascribed to collective nttemctlons (e.g. mukplc sc&tcring)). The second xesuits m J. decrease over ;1 tlmescale of tens of nanowzonds