𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The depth resolution of sputter profiling

✍ Scribed by H. H. Andersen


Publisher
Springer
Year
1979
Tongue
English
Weight
887 KB
Volume
18
Category
Article
ISSN
1432-0630

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


The effect of atomic-scale etch pit form
✍ G. Carter; M. J. Nobes; I. V. Katardjiev πŸ“‚ Article πŸ“… 1990 πŸ› John Wiley and Sons 🌐 English βš– 396 KB

## Abstract A very simplified model of atomic‐scale etch pitting during sputtering erosion for composition depth profiling is used to modify the Benninghoven–Hofmann approach to layer‐by‐layer sputtering. It is shown that analytically tractable defining equations result, with solutions that indicat

Influence of ion mixing, ion beam-induce
✍ Eun-Hee Cirlin; Yang-Tse Cheng; Philip Ireland; Bruce Clemens πŸ“‚ Article πŸ“… 1990 πŸ› John Wiley and Sons 🌐 English βš– 730 KB

## Abstract To study the factors limiting the depth resolution of sputter depth profiling, we have examined the influence of ion mixing, ion beam‐induced roughness and temperature on the interface resolution of metallic bilayers consisting of Pt on top of Ni or Ti. We studied Pt/Ni and Pt/Ti interf