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The dependence of growth rate of GaN buffer layer on growth parameters by metalorganic vapor-phase epitaxy

โœ Scribed by Xianglin Liu; Da-Cheng Lu; Lianshan Wang; Xiaohui Wang; Du Wang; Lanying Lin


Book ID
108342787
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
121 KB
Volume
193
Category
Article
ISSN
0022-0248

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Subject classification: 73.61.Ey; 81.15.Kk; S7.14 One-, two-and three-flow metalorganic vapor phase epitaxy (MOVPE) methods have been compared in GaN growth, and each growth is analyzed by computational fluid dynamics (CFD). It is found that two-flow method shows better growth condition for achievin