๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

The chemical sputtering of silica by Ar+ ions and XeF2

โœ Scribed by M.A. Loudiana; A. Schmid; J.T. Dickinson; E.J. Ashley

Publisher
Elsevier Science
Year
1984
Weight
57 KB
Volume
141
Category
Article
ISSN
0167-2584

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Excitation of XeF* by reactions of XeF2
Excitation of XeF* by reactions of XeF2 with Ar(3P0,2),Kr(3P2) and Xe(3P2)
โœ J.E. Velazco; J.H. Kolts; D.W. Setser; J.A. Coxon ๐Ÿ“‚ Article ๐Ÿ“… 1977 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 716 KB

The reactions of the lowest metast&bIe states of Ar, Rr and Xe with XeF2 were studied in a Bowing after$ow appamtus; XeF emission (from D \*111,2 and B 'C\* states) was observed in all cases. me toti rate constants (cm3 molecde-r S-I) for XeF\* formation were determined as 75 X l@' -Xe(3P2); 64 X lo