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The behavior of dopant incorporation and internal strain in AlxGa1−xAs0.03Sb0.97 grown by molecular beam epitaxy

✍ Scribed by A.Z. Li; J.X. Wang; Y.L. Zheng; G.P. Ru; W.G. Bi; Z.X. Chen; N.C. Zhu


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
285 KB
Volume
127
Category
Article
ISSN
0022-0248

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