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Temperature analysis for the linear cell in the vapor deposition process

โœ Scribed by Jongwook Choi; Kim Sungcho; Kim Jeongsoo


Book ID
105676092
Publisher
Springer-Verlag
Year
2005
Tongue
English
Weight
711 KB
Volume
19
Category
Article
ISSN
1738-494X

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A system has been developed that permits the deposition of device quality epitaxial silicon films at low temperatures. Using this system, epitaxial layers" have been grown that have a minoritycarrier lifetime of about 0.5 ms; the highest vahw reported for any low temperature silicon epitaxial proces