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Tantalum oxide films prepared by unbalanced reactive magnetron sputtering

✍ Scribed by N. Rama Rao; R. Chandramani; G. Mohan Rao

Book ID
110239206
Publisher
Springer
Year
1999
Tongue
English
Weight
38 KB
Volume
18
Category
Article
ISSN
0261-8028

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πŸ“œ SIMILAR VOLUMES

Reactive unbalanced magnetron sputtering
Reactive unbalanced magnetron sputtering of AIN thin films
✍ D BΓΊc; I HotovΓ½; S Haőčík; I CΜ†ervenΜ† πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 273 KB

## Aluminium nitride is of interest for potential use in various microelectronic and optoelectronic applications. C-axis oriented aluminium nitride (AINI thin films on (100) silicon were prepared by DC balanced and/or unbalanced magnetron reactive sputtering from an Al target under different depos