Tandem-photolithography process for thin-film sensors and micromechanics

✍ Scribed by Hermann Sachse; Klaus Bethe

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 333 KB
• Volume: 42
• Category: Article
• ISSN: 0924-4247
• DOI: 10.1016/0924-4247(94)80055-3

✦ Synopsis

This paper presents a new two-layer photoreslst process to avold photomask alignment errors m thm-film Sensor production A 'colour' photomask is used mstead of a conventIona chromunn mask. The problem of ahgnment IS transferred to the generation of the colour mask, I e , it has to be carried out only once