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Synthesis of silicon nitride and silicon oxide films by ion-assisted deposition

โœ Scribed by Netterfield, R. P. ;Martin, P. J. ;Sainty, W. G.


Book ID
115334581
Publisher
The Optical Society
Year
1986
Tongue
English
Weight
569 KB
Volume
25
Category
Article
ISSN
1559-128X

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Silicon nitride (SiN x ) films were prepared by ion-assisted deposition process. The films were analyzed by measurement of scanning electron microscopy (SEM), Fourier transform infrared spectrometry (FTIR), Xray photoelectron spectrometry, spectrophotometer, and ellipsometer measurements. The effect