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Synthesis of borides, carbides and nitrides in metal surfaces by high-dose ion implantation

โœ Scribed by Bernd Rauschenbach

Book ID
116015573
Publisher
Elsevier Science
Year
1986
Weight
299 KB
Volume
117
Category
Article
ISSN
0022-5088

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Properties of oxide and nitride layers i
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โœ Shigeo Ohira; Masaya Iwaki ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 652 KB

Recent advances in high dose ion implantation The surface properties such as depth profile, techniques have produced silicon-on-insulator chemical bond and structure, and electrical prop-(SOI) substrates for the fabrication of electronic erties of oxide and nitride layers in aluminium devices. Oxyge