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Synthesis and characterization of novel copolymers with the trimethylsilyl group for deep-UV photoresists

✍ Scribed by Wen-Yen Chiang; Yung-Ching Lin


Publisher
John Wiley and Sons
Year
2002
Tongue
English
Weight
221 KB
Volume
83
Category
Article
ISSN
0021-8995

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