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Synthesis and characterization of novel copolymers of carboxyphenylmaleimide and methacrylates with trimethylsiloxy groups for deep-UV photoresists

✍ Scribed by Wen-Yen Chiang; Ming-Lo Lee

Publisher: John Wiley and Sons
Year: 2003
Tongue: English
Weight: 169 KB
Volume: 90
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.12716

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