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Surface Topography of Vinyltriethoxysilane Films Deposited on the Silicon Dioxide Substrate (0001) Investigated by Atomic Force Microscopy

✍ Scribed by Wu, Yun; Cai, Chu Jiang; Shen, Zhi Gang; Ma, Shu Lin; Xing, Yu Shan

No coin nor oath required. For personal study only.

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