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Surface Texturing of TiO2Film by Mist Deposition of TiO2Nanoparticles

✍ Scribed by Gang Qin,Akira Watanabe

Book ID
126339858
Publisher
Nano-Micro Letters
Year
2013
Tongue
English
Weight
601 KB
Volume
5
Category
Article
ISSN
2311-6706

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Plasma cleaning of Si surfaces for TiO2
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✍ Akira Shibata; Kazumaro Kita; Kunio Okimura πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 155 KB

It has been shown that rutile-rich TiO 2 films with excellent electrical and chemical characteristics can be prepared by deposition on Si surfaces at low temperature, using ionized oxygen gas with an admixture of He gas. The Si surfaces were cleaned by etching with Ar gas before film deposition. We