Surface roughness and resistivity of Au film on Si-(111) substrate

✍ Scribed by Wu Tang; Kewei Xu; Ping Wang; Xian Li

• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 188 KB
• Volume: 66
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(02)00909-7

✦ Synopsis

Au films were deposited on Si-(111) substrate by magnetron sputtering technique. The structure of the films was characterized by X-ray diffraction (XRD). The resistivity and the surface roughness were measured by four-point probe and atomic force microscopy (AFM). The results showed that Au-( ) was the dominant preferred orientation and the surface roughness and resistivity depended on the deposition temperature. The change of resistivity appeared to be approximately linear with surface roughness.