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Surface mechanisms in the UVCVD of SiO2 films

✍ Scribed by C. Licoppe; C. Meriadec; Y.I. Nissim; J.M. Moison

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 499 KB
Volume: 54
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(92)90085-c

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