𝔖 Bobbio Scriptorium
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Surface interface's 300 mm wafer capability


Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
159 KB
Volume
28
Category
Article
ISSN
0026-2692

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✦ Synopsis


manufacturing and technology requirements outlined in the semiconductor industry technology roadmap for interconnect technologies." With improved planarization versus traditional coating methods, the Fairchild process solution is an excellent complement to CMP. By reducing deposition time, polishing time and pad wear during CMP, the system provides a greater cost-of-ownership adwmtage than conventional equipment. Advantages offered by the Falcon closed-bowl coating technology include a low solvent evaporation rate, which enables improved material distribution. Additiona/.ly, a controlled ambient airflow minimizes turbulence, generates no particulates during coating and provides reduced sensitivity to temperatm:e and humidity variations.


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