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Surface chemistry of H2S-sensitive tungsten oxide films

✍ Scribed by B. Frühberger; M. Grunze; D.J. Dwyer


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
687 KB
Volume
31
Category
Article
ISSN
0925-4005

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✦ Synopsis


We have applied X-ray photoelectron spectroscopy (XPS) arid ultraviolet photoelectron spectroscopy ( UPS ) ~o characterize t'lin tungsten oxide films and to investigate their interaction with hydrogen sulfide in view of their use as very sensitive hydrogen sulfide gas sensors. W 4f core-level spectra indicate a partial reduction of W ~ + after the ~eaction. No evidence for band bending after H2S dosing could be found in the valence-band spectra. The results suggest that the primary sensing mechanism involves the formation of oxygen vacancies on the surface in the presence of hydrogen sulfide. Alternative mechanisms, such as the formation of a tungsten sulfide or a hydrogen tungsten bronze on the surface, are judged to be unlikely.


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