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Surface analysis of the nanostructured W–Ti thin film deposited on silicon

✍ Scribed by S. Petrović; N. Bundaleski; D. Peruško; M. Radović; J. Kovač; M. Mitrić; B. Gaković; Z. Rakočević

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
596 KB
Volume
253
Category
Article
ISSN
0169-4332

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Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), angle-resolved x-ray photoelectron spectroscopy (ARXPS), ion scattering spectroscopy (ISS) and factor analysis (FA) have been used to study the deposition of titanium on polycrystalline aluminium at room temperature. Analysis