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Suppression of hot-electron-induced interface degradation in metal-oxide-semiconductor devices by backsurface argon bombardment

✍ Scribed by M.Q Huang; P.T Lai; J.P Xu; S.H Zeng; G.Q Li; Y.C Cheng


Book ID
108362359
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
195 KB
Volume
38
Category
Article
ISSN
0026-2714

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