Substrate Contribution to the Surface Impedance of HTS Films on Si
โ Scribed by N. Pompeo; R. Marcon; E. Silva
- Book ID
- 106428340
- Publisher
- Springer
- Year
- 2007
- Tongue
- English
- Weight
- 359 KB
- Volume
- 19
- Category
- Article
- ISSN
- 0896-1107
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๐ SIMILAR VOLUMES
Au films were deposited on Si-(111) substrate by magnetron sputtering technique. The structure of the films was characterized by X-ray diffraction (XRD). The resistivity and the surface roughness were measured by four-point probe and atomic force microscopy (AFM). The results showed that Au-( ) was
TiNi films were prepared by co-sputtering TiNi and Ti targets. X-ray photoelectron spectroscopy (XPS) was employed to study surface chemistry of the films and interfacial structure of Si/TiNi system. Exposure of the TiNi film to the ambient atmosphere (23 โข C and 80% relatively humidity) facilitated