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Study of the electronic trap distribution at the SiO2-Si interface utilizing the low-frequency noise measurement

✍ Scribed by Hei Wong; Yiu Chung Cheng

Book ID: 114536726
Publisher: IEEE
Year: 1990
Tongue: English
Weight: 758 KB
Volume: 37
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.55763

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